Vaksis PVD–handy series is really convenient for use and easily handled as the adjective “handy” described in the dictionary. The system allow multi-layer deposition in tha same loading..

  • Base pressure ≈ 2x10-7 Torr 
  • Substrate Size max. 4” diameter
  • Substrate Heating max. 500oC
  • Substrate Rotation 10 rpm
  • Thickness Measurement In-situ measurement with Quartz X-tal Oscillator
  • Temperature Controlling System PID method
  • Loading From the swing open bell jar




  • DC and/or RF Power Supply for Sputtering Magnetron Source
  • Effusion Cell A.C. Power Supply for Metal and/or  Organic Evaporation Sources
  • High-Current Low-Voltage A.C. Power Supply for Resistive Thermal Evaporation Source

Other PVD Systems