Vaksis ANGORA platform is composed of box-type vacuum chambers and can be used for deposition of four different materials on a single substrate.

  • Ultimate Vacuum Pressure ≤ 5x10-7 Torr
  • Substrate Size 4” diameter
  • Substrate Heating max. 800o
  • Substrate Rotation 3-30 rpm
  • Cooling Where necessary
  • Deposition Mode Upward
  • Thickness Measurement In-situ measurement with Quartz X-tal Oscillator
  • Control Fully Automatic




  • DC and/or RF Power Supply for Sputtering Magnetron Source
  • Effusion Cell A.C. Power Supply for Metal and/or Organic Evaporation Sources
  • High-Current Low-Voltage A.C. Power Supply for Resistive Thermal Evaporation Source
  • Power Supply for Electron Beam Evaporation Source

Other PVD Systems