PVD-handy / Twin series is a part of Vaksis PVD – handy platform. This series is really convenient for use and easily handled as the adjective “handy” described in the dictionary which involves different techniques and combinations.

  • Base Pressure:  ≈ 2x10-7 Torr
  • Number of Chambers  2
  • Substrate Size  4” diameter
  • Substrate Heating max. 500oC
  • Substrate Rotation:  3-30 rpm
  • Thickness Measurement In-situ measurement with Quartz X-tal Oscillator
  • Deposition Mode  Upward
  • Loading From the swig open bell jar




  • DC and/or RF Power Supply for Sputtering Magnetron Source
  • Effusion Cell A.C.  Power for Metal and/or OLED Evaporation Sources
  • High Current Low Voltage Power Supply for Resistive Thermal Evaporation Source
  • Power Supply for Electron Beam Evaporation Source

Other PVD Systems