MiDAS PVD 3T
This system can be used for deposition of maximum three different materials on a single substrate using thermal evaporation technique.
It also allows simultaneous deposition of three different materials at the same time on the same substrate.
- Base Pressure < 5x10-8 Torr
- Leak Rate < 10-8 Torr.l/s
- Substrate Size 4" diameter
- Substrate Heating Max. 800 oC
- Substrate Rotation 3 - 30 rpm
- Thickness Measurement In-situ measurement with Quartz X-tal Oscillator
- Deposition Method Resistive Thermal Evaporation
- Deposition Mode Upward (all sources)
- Number of Sources 3
- Power Generators 3
- Control Full automation by PC
For more detailed information, send an e-mail to info@vaksis.com.
