Special design evaporation system with dual thermal evaporation sources and manual control for low budget projects.

Designed and manufactured to deposit controlled nano- and micro-meter-thick thin films/coatings on that flat surfaces of max. 40 mm diameter wafers or glass.

  • Base Pressure < 2x10-7 Torr
  • Leak Rate < 10-8 Torr.l/s
  • High-speed Pump: 700 l/s diffusion pump
  • Mechanical Pump: 2.5 m3/h Dual Stage mechanical pump
  • Substrate Size: 40 mm diameter
  • Thickness Measurement: In-situ measurement with Quartz X-tal Oscillator
  • Deposition Mode: Upward (all sources)
  • Number of Sources: 2
  • Loading: From top
  • Control: Full automatic pumping, manual evaporation
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For more detailed information, send an e-mail to info@vaksis.com.