Glovebox Integrated Thin Film Deposition System

Designed and manufactured to deposit controlled nano- and micro-meter-thick thin films/coatings on flat surfaces on max. 40 mm diameter wafers or glass.

  • Base Pressure < 2x10-7 Torr
  • Leak Rate < 10-8 Torr.l/s
  • High-speed Pump 700 l/s diffusion pump
  • Mechanical Pump 2.5 m3/h dual stage mechanical pump
  • Substrate Size 40 mm diameter
  • Thickness Measurement In-situ measurement with Quartz X-tal Oscillator
  • Deposition Mode Upward
  • Number of Sources 2
  • Loading From top
  • Control Manual


  • Material 304 Stainless Steel, Butyl Rubber Gloves

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