This system can be used for deposition of maximum three different materials on a single substrate using thermal evaporation, organic evaporation and sputtering techniques.

  • Base Pressure < 2x10-7 Torr
  • Substrate Size 3" diameter
  • Substrate Heating 350 oC
  • Number of Thermal Evaporation Source 1
  • Number of OLED/OPV Source 1
  • Number of RF/DC Magnetron 1
  • Power Generator 1 DC 500 W (RF 300 W is optional)
  • Thickness Measurement In-situ measurement with Quartz X-tal Oscillator
  • Control Full automation by PC

For more detailed information, send an e-mail to

Other Multi Technique