Multiple star
Vaksis Multiple Star platform is composed of many vacuum chambers. This platform has a linear cluster structure and involves different techniques and combinations.
- Ultimate Vacuum Pressure≤ 5x10-8 Torr
- Number of Chambers up to 5
- Substrate Size 4”- 8” diameter
- Substrate Heating max. 400oC
- Substrate Rotation 3-30 rpm
- Cooling Where necessary
- Loading With Load Lock and Transfer Chamber
- Control Fully Automatic
- Additional Gas Safety Available Upon Request
DOWNLOAD BROCHURE
POWER SOURCES
- DC and/or RF Power Supply for Sputtering Magnetron Source
- Effusion Cell A.C. Power Supply for Metal and Organic Evaporation Sources
- High-Current Low-Voltage A.C. Power Supply for Resistive Thermal Evaporation Source
- Power Supply for Electron Beam Evaporation Source
- DC and/or RF Power Supply for Capacitively coupled plasma (CCP) or RF Power Supply for Inductively coupled plasma (ICP) Sources
