Vaksis Multiple Star platform is composed of many vacuum chambers. This platform has a linear cluster structure and involves different techniques and combinations.

  • Ultimate Vacuum Pressure≤ 5x10-8 Torr
  • Number of Chambers up to 5
  • Substrate Size 4”- 8” diameter
  • Substrate Heating max. 400o
  • Substrate Rotation 3-30 rpm
  • Cooling Where necessary
  • Loading With Load Lock and Transfer Chamber 
  • Control Fully Automatic
  • Additional Gas Safety Available Upon Request

 

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POWER SOURCES

  • DC and/or RF Power Supply for Sputtering Magnetron Source
  • Effusion Cell A.C. Power Supply for Metal and Organic Evaporation Sources
  • High-Current Low-Voltage A.C. Power Supply for Resistive Thermal Evaporation Source
  • Power Supply for Electron Beam Evaporation Source
  • DC and/or RF Power Supply for Capacitively coupled plasma (CCP) or RF Power Supply for Inductively coupled plasma (ICP) Sources