Vaksis GünEr platform is composed of many vacuum chambers and a load lock chamber. This platform has a circular cluster structure and involves different techniques and combinations.

  • Ultimate Vacuum Pressure ≤ 5x10-8 Torr
  • Number of Process Chambers up to 8
  • Number of Load Lock Chamber 1
  • Number of Robotic Transfer Chamber 1
  • Substrate Size 30x30 cm
  • Substrate Heating max. 400oC
  • Cooling Where necessary
  • Loading With Load Lock and Transfer Chamber
  • Control Fully Automatic
  • Additional Gas SafetyAvailable Upon Request
DOWNLOAD BROCHURE

POWER SOURCES

  • DC and/or RF Power Supply for Sputtering Magnetron Source
  • Effusion Cell A.C. Power Supply for Metal and OLED Evaporation Sources
  • High-Current Low-Voltage A.C. Power Supply for Resistive Thermal Evaporation Source
  • Power Supply for Electron Beam Evaporation Source
  • DC and/or RF Power Supply for Capacitively coupled plasma (CCP) or RF Power Supply for Inductively coupled plasma (ICP) Sources