This system can be used for deposition of maximum four different materials on a single substrate using electron beam evaporation technique.

  • Base Pressure ≤ 5x10-8 Torr
  • Substrate Size 4” diameter
  • Substrate Heating up to 650o
  • Substrate Rotation 3-30 rpm
  • Deposition Mode Upward
  • Number of Sources One e-beam evaporator source with 4 crucibles
  • Crucible Size 8 cc each
  • Thickness Measurement In-situ measurement with Quartz X-tal Oscillator
  • Control Fully Automatic
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For more detailed information, send an e-mail to info@vaksis.com.

Other E-beam Evaporation