Glovebox Entegrated Thin Film Deposition System:

This system is comprised of two chambers and two gloveboxes. One chamber includes six effusion cells and the other chamber includes four thermal evaporation sources.

  • Base Pressure < 5x10-8 Torr
  • Leak Rate < 10-8 Torr.l/s
  • Substrate Heating Max. 800 oC
  • Substrate Rotation 3 - 30 rpm
  • Thickness Measurement In-situ measurement with Quartz X-tal Oscillator
  • Control Full automation by PC

​Glovebox

  • Material 304 Stainless Steel, Butyl Rubber Gloves
  • Flow Rate 45 m3/hr
  • Leak Rate < 0.001 vol%/hr According to ISO 10648-2 Procedure
  • Purity Level
  • Standard < 1 ppm O2, H2O in Nitrogen, Argon or Helium
  • Optional Ultra High Purity System < 0.1 ppm O2, H2O
DOWNLOAD BROCHURE

For more detailed information, send an e-mail to info@vaksis.com.