Application Areas:

Mini RF Plasma Cell Microwave Plasma Cell

The surface properties of the materials can be modified by exposing them to RF or Microwave plasma. These plasma systems can also be used for sterilisation.

Technical Specifications:

Base Pressure: < 5x10^-5 Torr
Substrate Area: 3”  diameter
Substrate Heating: None
Substrate to Magnetron Level Adjustment: Two directions (up & down) are standard even when the chamber is  under vacuum
RF Frequency: 13,56 Mhz
Microwave Frequency: 2,4 GHz
Loading: From top plate or Load Lock (optional)
Control: Full Automatic by Computer (Semi-Automatic from Control Panel optional)