MiCKS
Designed and produced to be used in the R&D laboratories to deposit anti-reflection and semi-transparent coatings.
NanoD-Sputter Designed and produced to deposit controlled nano and micro dimensional thin films/layers on the flat surfaces of 2” to 6” diameter wafers, utilizing sputtering method.
NanoD-Vapor
Designed and produced to deposit nano and micro dimensional homogenous thin films/layers on the both sides of plastic foils, without reloading, utilizing Thermal Evaporation method.
PVD-HardCoater
Designed and manufactured to deposit hard ceramic coatings on shaping tools (i.e. cutting tools, punches, etc.) utilizing the reactive sputtering method.
PVD-Handy
Designed and manufactured to deposit controlled nano- and micro-dimensional thin films/coatings on flat surfaces of 4” diameter (max.) wafers, utilizing sputtering method.